Author:
Nejim A.,Li Y.,Marsh C.D.,Hemment P.L.F.,Chater R.J.,Kilner J.A.,Booker G.R.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
1. Proc. 5th Int. Symp. on SOI Technology and Devices;Nakashima,1992
2. Proc. 5th Int. Symp. on SOI Technology and Devices;Yoshino,1992
3. Formation of thin silicon films using low energy oxygen ion implantation
4. Proc. 5th Int. Symp. on SOI Technology and Devices;Li,1992
5. Analysis of thin‐film silicon‐on‐insulator structures formed by low‐energy oxygen ion implantation
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