Sputtering of Au, Csl and LiNbO3 by multiply charged Ar ions

Author:

Weathers D.L.,Tombrello T.A.,Prior M.H.,Stokstad R.G.,Tribble R.E.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Ion-photon emission under bombardment of Ta target with cluster and multiply charged Bi ions;Vacuum;2023-07

2. Ion fluence dependence of the total sputtering yield and differential angular sputtering yield of bismuth due to 50keV argon ion irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-08

3. Projectile charge and velocity effect on UO2 sputtering in the nuclear stopping regime;The European Physical Journal D;2006-03-14

4. INTERACTION OF HIGHLY CHARGED Xeq+ (q = 26, 27, 30) IONS WITH MOLYBDENUM SURFACE;International Journal of Modern Physics B;2005-07-10

5. Electronic sputtering of solids by slow, highly charged ions: Fundamentals and applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-03

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