Effect of Cr implantation on the morphology of Al:Si films-Reference-Cited by-同舟云学术

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Effect of Cr implantation on the morphology of Al:Si films

Published:1996-06 Issue:1-4 Volume:113 Page:191-195
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Zaborowski M.,Gawlik G.,Barcz A.,Turos A.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference7 articles.

1. Metallurgical topics in silicon device interconnections: Thin film stresses

2. A transmission electron microscopy study of hillocks in thin aluminum films

3. Hillock Reduction in Ion‐Implanted Metal

4. Ion beam suppression of hillock growth in aluminium thin films

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Role of chromium ion implantation on the corrosion behavior of zirconium in 1N H2SO4;Applied Surface Science;2004-05

2. Role of chromium ion implantation on the corrosion behavior of zircaloy-4 in 0.5 m H2SO4;ELECTROCHIM ACTA;2004

3. Modification of Al-based metallization for improved surface morphology;Microelectronic Engineering;1997-11

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