Oxygen coverage dependent emission of sputtered neutrals and secondary ions-Reference-Cited by-同舟云学术

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Oxygen coverage dependent emission of sputtered neutrals and secondary ions

Published:1986-04 Issue:1-6 Volume:15 Page:169-172
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Gnaser H.,Saidoh M.,Von Seggern J.,Hofer W.O.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference26 articles.

1. A comparison of SIMS with other techniques based on ion-beam solid interactions

2. Thin Film and Depth Profile Analysis;Oechsner,1984

3. Sputtering of Surfaces by Positive Ion Beams of Low Energy

4. Analysis of solids by secondary ion and sputtered neutral mass spectrometry

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Energy and Angular Resolution Dynamic Secondary Ion Mass Spectrometry;Microbeam and Nanobeam Analysis;1996

2. Secondary ion yields depending on the primary oxygen ion energy in cameca IMS-4f instrument;Surface and Interface Analysis;1994-12

3. Sputtering of neutral and ionic indium clusters;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-07

4. Angular, energy, and mass distribution of sputtered particles;Topics in Applied Physics;1991

5. Isotope effects in secondary-ion emission;Radiation Effects and Defects in Solids;1989-07

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