N+ ion implantation effects on microhardness and adhesion in TiO2 films
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference15 articles.
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1. Influence of nitrogen content on properties of direct current sputtered TiOxNy films;physica status solidi (a);2004-01
2. The Effect of Nitrogen Ion Implantation on the Photoactivity of TiO2 Rutile Single Crystals;The Journal of Physical Chemistry B;2003-12-11
3. Nitrogen Effects on Crystallization Kinetics of Amorphous TiOxNy Thin Films;Journal of Materials Research;2002-03
4. The smoothness, hardness and stress in titanium nitride following argon gas cluster ion beam treatment;Surface and Coatings Technology;2001-05
5. Properties of titanium nitride fabricated on stainless steel by plasma-based ion implantation/deposition;Materials Science and Engineering: A;2000-04
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