Author:
Andersen H.H.,Stenum B.,Sørensen T.,Whitlow H.J.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference40 articles.
1. SPIG 1980;Andersen,1980
2. H.H. Andersen, in: Ion implantation and beam processing, eds., J.S. Williams and J.M. Poate (Academic Press, London) in press.
3. Symposium on Sputtering;Andersen,1980
4. Depth of origin of sputtered atoms
5. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
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3. Isotopic fractionation in the sputtering of 92Mo-100Mo targets;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-02
4. Angular, energy, and mass distribution of sputtered particles;Topics in Applied Physics;1991
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