Effects of ion implantation on the photoelectrochemical properties of TiO2
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference8 articles.
1. Electrochemistry at Semiconductor and Oxidized Metal Electrodes;Morrison,1980
2. Electrochemical Photolysis of Water at a Semiconductor Electrode
3. Single crystal syntheses by the electrolyses of molten titanates, molybdates and vanadates
4. Ion-Beam Modification of Amorphous WO3Film and Its Properties as a High-Contrast Inorganic Ion Resist
5. Proc. 7th Int. Conf. on Ion Implantation Technology;Koshida,1989
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1. Visible light responses of sulfur-doped rutile titanium dioxide photocatalysts fabricated by anodic oxidation;Applied Catalysis B: Environmental;2009-09
2. Superhydrophilicity and XPS study of boron-doped TiO2;Applied Surface Science;2008-08
3. Effects of ion beam mixing on the depth profiles of thin metal layer in TiO2;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1998-05
4. Photoelectrochemical Properties of Anodic Oxide Film on Niobium;Materials Transactions, JIM;1994
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