Recoil implantation and interface mixing: A computer simulation study
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference21 articles.
1. Mechanism of ion beam induced mixing of layered solids
2. Computer simulation of atomic mixing during ion bombardment
3. Sputtering of Si with keV Ar+Ions. II. Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
4. Evolve, a time-dependent monte carlo code to simulate the effects of ion-beam-induced atomic mixing
5. Ion-beam induced atomic mixing at the Si02/Si interface studied by means of monte carlo simulation
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1. Effect of Al ion implantation on the adhesion of Al films to SiO2 substrates;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-09
2. Molecular dynamics simulations of ion beam mixing of Mo-on-Si bilayers;Physica Status Solidi (a);1994-04-16
3. Molecular dynamics simulations of the intermixing of a metallic heterostructure irradiated at near-threshold energies;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-12
4. The activation energy of electrical conduction of ion beam mixed Sb/n-Si Schottky contacts;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-06
5. An overview of the transport theory of charged particles;Radiation Physics and Chemistry;1993-04
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