Recoil implantation and interface mixing: A computer simulation study

Author:

Cui Fu-Zhai ,Li Heng-De

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 28 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Effect of Al ion implantation on the adhesion of Al films to SiO2 substrates;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-09

2. Molecular dynamics simulations of ion beam mixing of Mo-on-Si bilayers;Physica Status Solidi (a);1994-04-16

3. Molecular dynamics simulations of the intermixing of a metallic heterostructure irradiated at near-threshold energies;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-12

4. The activation energy of electrical conduction of ion beam mixed Sb/n-Si Schottky contacts;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-06

5. An overview of the transport theory of charged particles;Radiation Physics and Chemistry;1993-04

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