Dry etching of indium phosphide
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. On the Formation of Planar‐Etched Facets in GaInAsP / InP Double Heterostructures
2. The design of plasma etchants
3. Ion Bombardment Modification of Surfaces;Auciello,1984
4. Plasma etching of III‐V compound semiconductors
5. Reactive‐ion etching of GaAs and InP using CCl2F2/Ar/O2
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