Plasma diagnostics in ion-assisted physical vapour deposition systems
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference11 articles.
1. Characteristics of a thermionically assisted triode ion-plating system
2. Enhanced ARE apparatus and TiN synthesis
3. Deposition of Ti-N compounds by thermionically assisted triode reactive ion plating
4. Activated Reactive Evaporation Process for High Rate Deposition of Compounds
5. Physical processes in the substrate dark space in biased deposition systems
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1. Determination of the electron temperature profile above the evaporative source in an ion plating discharge by spatially resolved optical emission spectroscopy;Thin Solid Films;2003-06
2. Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-10
3. Estimation of density of charge species in a triode discharge system;Vacuum;1997-10
4. A coating thickness uniformity model for physical vapour deposition systems: overview;Surface and Coatings Technology;1995-02
5. Analysis of the properties of radio frequency ion plated Cu films based on the calculation of the ion energy available per film atom;Journal of Applied Physics;1993-11-15
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