The PACVD method for surface layer deposition using a glow discharge in H2+N2+Ti(OC3H7)4
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x
2. Proc Eur Conf on Chemical Vapour Deposition;Rie,1987
3. Formation of Titanium Nitride Layers and Composite Layers Under Glow Discharge Conditions
4. Formation and properties of composite layers on stainless steel
5. Proc 6th Int Conf Ion and Plasma Assisted Techniques;Arai,1987
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2. Surface properties of Ti(N,C,O) thin coating layers deposited by PA-MOCVD for bipolar plates used PEMFC;Metals and Materials International;2011-06
3. Increased wear and corrosion resistance of Ti(NCO) layers by annealing in a nitrogen plasma atmosphere;Vacuum;2002-10
4. Formation and properties of a carbonitrided layer in 304 stainless steel using different radio frequency plasma powers;Thin Solid Films;2002-02
5. Properties of multicomponent layers produced on high speed steel by combined nitriding and PACVD methods under glow discharge conditions;Le Journal de Physique IV;1999-09
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