Oxidation mechanism in rf CO2 plasma
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. Josephson Tunneling Barriers by rf Sputter Etching in an Oxygen Plasma
2. Extended Abstracts of ICSSDM;Nakano,1984
3. Review of oxidation processes in plasmas†
4. Oxide growth in an rf plasma
5. Plasma oxidation
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