Rf plasma properties of flat electrodes with multi-input terminals
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference13 articles.
1. Summary Abstract: Diagnostics in plasma processing
2. Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
3. Theoretical analysis of the electrode sheath in rf discharges
4. High-Performance Hydrogenated Amorphous Silicon-Germanium Solar Cells Fabricated by Photochemical Vapor Deposition
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