Plasma activated physical vapour deposition (PAPVD) by hollow cathode arc (HCA)-Reference-Cited by-同舟云学术

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Plasma activated physical vapour deposition (PAPVD) by hollow cathode arc (HCA)

Published:1990-01 Issue:7-9 Volume:41 Page:1965-1967
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Lunk A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference14 articles.

1. Plasma Technology,1983

2. Proc 2nd Int Conf Peacef Uses At Energy;Luce,1985

3. J R Morley, US Patent, 3 562 141.

4. Hollow Cathode Arcs

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4. Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N$$_2$$ and Ar + O$$_2$$ gas mixtures;The European Physical Journal D;2022-11

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