Thermal and plasma models of pulsed heating of thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference55 articles.
1. Laser Annealing in Semiconductors;Spaepen,1982
2. Pulsed Annealing of Semiconductor Materials;Dvurechensky,1982
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Structural transformation in silicon by pulse heating;Progress in Crystal Growth and Characterization of Materials;1992-01
2. Crystallization Processes and Structures of Semiconductor Films;Springer Proceedings in Physics;1989
3. On the kinetics of solid phase regrowth and dopant activation during rapid thermal annealing of implantation amorphized silicon;Journal of Applied Physics;1988-07-15
4. Mechanical stress in the crystallization process of amorphous semiconductors by pulse action;Physica Status Solidi (a);1988-04-16
5. On the Role of Interfacial Defect Sites During Solid Phase Epitaxial Regrowth of Implantation Amorphized Silicon;MRS Proceedings;1988
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