The influence of N2 partial pressure and substrate bias on electron density and temperature in a dc sputtering diode
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference16 articles.
1. Plasma Diagnostics and Energy Transport of a dc Discharge Used for Sputtering
2. Shape of cathode dark space of a sputtering plasma determined from probe measurements
3. Langmuir probe measurements in the negative glow of a sputtering DC discharge
4. Electron energy distributions in a sputtering discharge
5. Plasma diagnostics with electric probes
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2. Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-01
3. Investigation into nitrogen–inert gas interactions in d.c. diode glow discharges;Surface and Coatings Technology;2001-07
4. Parametrization of Laframboise’s results for spherical and cylindrical Langmuir probes;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09
5. New trends on nitriding in low pressure arc discharges studied by optical emission spectroscopy;Surface and Coatings Technology;1996-12
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