Experimental and simulated XPS depth profiles of low-energy high dose nitrogen implanted into aluminium
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. Ion Implantation and Beam Processing;Anderson,1984
2. Bombardment-induced compositional change with alloys, oxides, oxysalts, and halides
3. Comparative XPS and SIMS depth profile analysis of Cu-implanted silicon: evidence of segregation effects
4. Simple Monte-Carlo computer procedure for the sputtering and depth parameter determination of implanted ions in amorphous targets
5. Monte Carlo simulation of sputtering and saturation phenomena for low energy noble gas ions
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2. Study of fundamental processes affecting the structure of the cathode zone of nitrogen/titanium dc discharge;Journal of Physics D: Applied Physics;2000-02-08
3. Study of low energy high dose nitrogen implantation in aluminium, iron, copper and gold;Surface and Interface Analysis;1999-07
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5. Surface Analysis: X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy;Analytical Chemistry;1998-05-01
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