An optimal neural network plasma model: a case study
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Process Chemistry and Technology,Computer Science Applications,Software,Analytical Chemistry
Reference23 articles.
1. Two-dimensional hybrid model of inductively coupled plasma sources for etching;Ventzek;Appl. Phys. Lett.,1994
2. Two-dimensional fluid model of high density inductively coupled plasma sources;Stewart;J. Vac. Sci. Technol., B,1994
3. Statistical experimental design in plasma etch modeling;May;IEEE Trans. Semicond. Manuf.,1991
4. Advantages of plasma etch modeling using neural networks over statistical techniques;Himmel;IEEE Trans. Semicond. Manuf.,1993
5. Neural Networks;Freeman,1991
Cited by 65 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A novel on-line microwave diagnostic for an atmospheric pressure air plasma based on an artificial neural network;Physics of Plasmas;2023-12-01
2. Measurement and analysis of water ecological carrying capacity in the Yangtze River Economic Belt, China;Environmental Science and Pollution Research;2023-08-08
3. A regression model for plasma reaction kinetics;Journal of Physics D: Applied Physics;2023-06-13
4. Using Deep Convolutional Neural Networks to Classify the Discharge Current of a Cold Atmospheric-Pressure Plasma Jet;IEEE Transactions on Plasma Science;2023-02
5. Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes;Computers & Chemical Engineering;2022-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3