Author:
Gust Karl R.,Heeg Mary Jane,Winter Charles H.
Subject
Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry
Reference61 articles.
1. Barriers Against Copper Diffusion into Silicon and Drift Through Silicon Dioxide
2. For other relevant reviews, see: (a) R. Blumenthal, G. Janssen (Eds.), Advanced Metallization for ULSI Applications in 1994, Materials Research Society, Pittsburgh, PA, 1995.
3. (b) B. Roberts, A. Harrus, R.L. Jackson, Solid State Technol. (1995) 69.
4. (c) S.P. Murarka, R.J. Gutmann, A.E. Kaloyeros, W.A. Lanford, Thin Solid Films 236 (1993) 257.
5. (d) J. Li, Y. Shacham-Diamand, J.W. Mayer, Mater. Sci. Rep. 9 (1992) 1.
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