An integrated gas sensor technology using surface micro-machining

Author:

Chan Philip C.H,Yan Gui-zhen,Sheng Lie-yi,Sharma Rajnish K,Tang Zhenan,Sin Johnny K.O,Hsing I-Ming,Wang Yangyuan

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. R. Taguchi, Japanese Patent 45-38200 (1962).

2. A low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering;Sheng;Sens. Actuators B: Chem.,1998

3. Design and analysis of a micro-hotplate for integrated gas sensor applications;Fung;Sens. Actuators A: Phys.,1996

4. Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing;Suehle;IEEE Electron Device Lett.,1993

5. Guizhen Yan, Philip C.H. Chan, I-Ming Hsing, Rajnish K. Sharma, Johnny K.O. Sin, An improved TMAH etching silicon method without attacking exposed aluminum, in: Proceedings of the MEMS’2000.

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