Multiple-energy ion implantation effects on distribution profiles: A Monte Carlo case study-Reference-Cited by-同舟云学术

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Multiple-energy ion implantation effects on distribution profiles: A Monte Carlo case study

Published:1985-02 Issue:1 Volume:69 Page:13-20
ISSN:0025-5416
Container-title:Materials Science and Engineering
language:en
Short-container-title:Materials Science and Engineering

Author:

Goktepe Omer F.

Publisher

Elsevier BV

Subject

General Engineering

Reference44 articles.

1. Proc. 2nd Int. Conf. on Ion Beam Modification of Materials;Clayton,1981

2. Amorphous metals and ion implantation

3. VLSI Technology;Seidel,1983

4. Recoil implantation yields and depth profiles

5. Proc. 2nd Int. Conf. on Ion Beam Modification of Materials;Sigmund,1981

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion Beam Implantation and Plasma Immersion Ion Implantation. Application on Nitrided Ti-6Al-4V Titanium Alloy;Microscopy Microanalysis Microstructures;1997

2. Phase analysis, microhardness and tribological behaviour of Ti-6Al-4V after ion implantation of nitrogen in connection with its application for hip-joint prosthesis;Thin Solid Films;1995-10

3. Influence of dose effects on depth distribution of implanted particles;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-09

4. Ion sources and implantation systems;Materials Science and Engineering;1987-06

5. Model dependence of recoil implantation in binary solid;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1986-03

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