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An experimental and numerical study of particle nucleation and growth during low-pressure thermal decomposition of silane

  • Published:2003-06 Issue:6 Volume:34 Page:691-711
  • ISSN:0021-8502
  • Container-title:Journal of Aerosol Science
  • language:en
  • Short-container-title:Journal of Aerosol Science

Author:

Nijhawan Sandeep,McMurry Peter H,Swihart Mark T,Suh Song-Moon,Girshick Steven L,Campbell Stephen A,Brockmann John E

Publisher

Elsevier BV

Subject

Pollution,Atmospheric Science,Fluid Flow and Transfer Processes,Mechanical Engineering,Environmental Engineering

Reference62 articles.

1. Thermodynamics of the silicon–chlorine–hydrogen system;Allen;Journal of Electrochemicals,1986

2. Mechanism of formation tri- and tetrasilane in the reaction of atomic hydrogen with monosilane and the thermochemistry of Si2H4 isomers;Becerra;Journal of Physical Chemistry,1987

3. Low pressure deposition of polycrystalline silicon from silane;Brekel;Journal of Crystal Growth,1981

4. Reactive sticking coefficients for silane and disilane on polycrystalline silicon;Buss;Journal of Applied Physics,1988

5. Chiu, C.-P. (1992). Modeling thermal plasma synthesis of fine powders. Ph.D. Thesis, University of Minnesota.

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