Study of indium tin oxide thin film for separative extended gate ISFET

Author:

Yin Li-Te,Chou Jung-Chuan,Chung Wen-Yaw,Sun Tai-Ping,Hsiung Shen-Kan

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference21 articles.

1. T. Matsuo, M. Esashi, Methods of ISFET fabrication, Sensors and Actuators 1 (1981) 77–96.

2. Development of an ion sensitive solid-state device for neurophysiological measurements;Bergveld;IEEE Trans. Biomed. Eng.,1970

3. Hydrogen, calcium and potassium ion sensitive FET transducers: A preliminary report;Moss;IEEE Trans. Biomed. Eng.,1978

4. Hung-Kwei Liao, Jung-Chaun Chou, Wen-Yaw Chung, Tai-Ping, Shen-Ken Hsiung, Study on the interface trap density of the Si3N4/SiO2 gate ISFET, in: Proceedings of the Third East Asian Conference on Chemical Sensors, Seoul, South Korea, November 1997, pp. 394–400.

5. Li-Te Yin, Jung-Chuan Chou, Wen-Yaw Chung, Tai-Ping, Shen-Ken Hsiung, Characteristics of silicon nitride after O2 plasma treatment for pH ISFET applications, in: Proceeding of 1998 International Electron Devices and Materials Symposia, B, C, National Cheng Kung University, Tainan, Taiwan, ROC, December 1998, pp. 267–270.

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