Effects of O2 thermal annealing on the properties of CVD Ta2O5 thin films
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference25 articles.
1. Preparation and Properties of Ta2 O 5 Films by LPCVD for ULSI Application
2. Structure and Electrical Properties of Thin Ta2O5Deposited on Metal Electrodes
3. Effects of annealing conditions on the properties of tantalum oxide films on silicon substrates
4. Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition
5. Rapid thermal processed thin films of reactively sputtered Ta2O5
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