The quadratic finite element thermal analysis of silicon irradiated by a pulsed KrF excimer laser-Reference-Cited by-同舟云学术

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The quadratic finite element thermal analysis of silicon irradiated by a pulsed KrF excimer laser

Published:2000-06 Issue:2-4 Volume:17 Page:409-413
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Nakamiya Toshiyuki,Ikegami Tomoaki,Ebihara Kenji

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference13 articles.

1. Influence of melt depth in laser crystallized poly-Si thin film transistors

2. Microstructural characterization of solid-phase crystallized amorphous silicon films recrystallized using an excimer laser

3. Time-Resolved Imaging and Photoluminescence of Gas-Suspended Nanoparticles Synthesized by Laser Ablation: Dynamics, Transport, Collection, and Ex Situ Analysis

4. J.N. Reddy, An Introduction to the Finite Element Method, McGraw-Hill, New York, p. 13

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2. Pulsed Neodymium-Doped Yttrium Aluminum Garnet Laser Heating of Multiwalled Carbon Nanotube Film;Japanese Journal of Applied Physics;2011-08-01

3. Pulsed Nd:YAG laser heating and treatment on multi-walled carbon nanotubes film;Thin Solid Films;2010-09

4. Analysis of silicon via hole drilling for wafer level chip stacking by UV laser;International Journal of Precision Engineering and Manufacturing;2010-08

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