Isothermal aging and electromigration reliability of Cu pillar bumps interconnections in advanced packages monitored by in-situ dynamic resistance testing

Author:

Wang Shuai,Feng Jiayun,Wang Wei,Wu Peng,Wen Jiayue,Yang Dongsheng,Huang Yilong,Tian Ruyu,Wang Shang,Tian Yanhong

Funder

Fundamental Research Funds for the Central Universities

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference34 articles.

1. Low-temperature reliability enhancement of system-in-package with silicon-based resistors and its electrothermal analysis;Wang;Microelectron Reliab,2023

2. EMI shielding technology in 5G RF system in package module;Li,2020

3. Recent advances in Sn-based lead-free solder interconnects for microelectronics packaging: materials and technologies;Dele-Afolabi;J Mater Res Technol,2023

4. Impact of CPB diameter and solder material on reflow soldering: a computational study with thermal fluid-structure interaction;Lee;J Electron Mater,2023

5. CPB design parameters for flip chip integration;Wen,2021

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