Study of Cu contamination during copper integration for subquarter micron technology
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Edelstein D, et al. Proc. IEEE IEDM 1997:773
2. Venkatesan S, et al. Proc. IEEE IEDM 1997:769
3. Marcadel C, et al. Proc. IEEE IEDM 1997:405
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