Ultra-thin SiO2 film studies: index, thickness, roughness and the initial oxidation regime
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. Optical Evidence for a Silicon‐Silicon Oxide Interlayer
2. Measurements and Modeling of Thin Silicon Dioxide Films on Silicon
3. Film thickness measurements of SiO2 by XPS
4. Irene EA, in: Greene JE, editor. CRC critical reviews in solid state and materials science 1988;14(2):175
5. Zur berechnung des tunnelstroms durch eine trapezförmige potentialstufe
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