An investigation on RF CMOS stability related to bias and scaling

Author:

Su Jiong-Guang,Wong Shyh-Chyi,Chang Chun-Yen

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference26 articles.

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4. An assessment of the state-of-the-art 0.5 μm bulk CMOS technology for RF applications;Voinigescu;Proc IEDM,1995

5. 0.15-μm RF CMOS technology compatible with logic CMOS for low-voltage operation;Saito;IEEE Trans Electron Dev,1998

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