Depth profiling using total reflection X-ray fluorescence spectrometry alone and in combination with ion beam sputtering-Reference-Cited by-同舟云学术

Depth profiling using total reflection X-ray fluorescence spectrometry alone and in combination with ion beam sputtering

Published:1997-07 Issue:7 Volume:52 Page:795-803
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Schwenke H,Knoth J,Günther R,Wiener G,Bormann R

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference9 articles.

1. D.K.G. de Boer, Phys. Rev. B, 44 (1991) 498–511.

2. U. Weisbrod, R. Gutschke, J. Knoth and H. Schwenke, Appl. Phys. A, 53 (1991) 449–456.

3. H. Schwenke J. Knoth, Anal. Sci., 11 (1995) 533–537.

4. G. Wiener, C. Michaelsen, J. Knoth, H. Schwenke and R. Bormann, Rev. Sci. Instrum., 66 (1995) 20–23. G. Wiener, R. Günther, C. Michaelsen, J. Knoth, H. Schwenke and R. Bormann, Spectrochim. Acta, Part B, 52 (1997) 813–821.

5. V.K. Agarval, Phys. Today, June (1988) 40–46.

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