Deep boron diffusion induced surface damage in silicon-Reference-Cited by-同舟云学术

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Deep boron diffusion induced surface damage in silicon

Published:2016-05 Issue: Volume:170 Page:76-79
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Dutta Shankar,Pandey Akhilesh,Singh Milap,Pal Ramjay

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference21 articles.

1. Impurity doping processes in silicon;Fair,1981

2. Fundamental of Microfabrication – The Science of Miniaturization;Madau,2002

3. Etching and boron diffusion of high aspect ratio Si trenches for released resonators

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1. Overview of residual stress in MEMS structures: Its origin, measurement, and control;Journal of Materials Science: Materials in Electronics;2021-03

2. Design and fabrication of SOI technology based MEMS differential capacitive accelerometer structure;Journal of Materials Science: Materials in Electronics;2019-08

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