Plasma optical emission spectroscopy as a tool to monitor TiNx deposition via reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Plasma optical emission spectroscopy as a tool to monitor TiNx deposition via reactive magnetron sputtering

Published:2021-02 Issue: Volume:285 Page:129043
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Sierra-Cruz I.,Sanginés R.^ORCID,Cruz J.,Machorro-Mejía R.

Funder

Dirección General de Asuntos del Personal Académico, Universidad Nacional Autónoma de México

Consejo Nacional de Ciencia y Tecnología

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference13 articles.

1. Tribological performance of titanium nitride coatings: A comparative study on TiN-coated stainless steel and titanium alloy;Łępicka;Wear,2019

2. Surface modification of medical implants and surgical devices using TiN layers;Coll;Surf. Coat. Technol.,1988

3. Growth of ITO thin films by magnetron sputtering: OES study, opticaland electrical properties;Iljinas;Vacuum,2009

4. Plasma optical emission spectroscopy diagnostic during amorphous silicon thin films deposition by RF-sputtering technique;Benchiheb;Mater. Sci. Eng. B.,2010

5. Optical emission spectroscopy study of r.f. magnetron sputtering discharge used for multilayers thin film deposition;Zambrano;Surf. Coat. Technol.,2003

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of the number of bilayers in Ti/TiN coatings on AISI 316L deposited by sputtering on their hardness, adhesion, and wear;Materials Letters;2022-06

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