Author:
Liu Xuejian,Pu Xipeng,Li Huili,Qiu Fagui,Huang Liping
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
6 articles.
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1. A Brief Review of Plasma Enhanced Atomic Layer Deposition of Si3N4;Applied Science and Convergence Technology;2019-09-30
2. A family of 1,1,1,2,2,2-hexa(-primary-)amino-disilanes as potential CVD precursors: Tuning thermal properties by small variation of the substituent;Polyhedron;2016-10
3. Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films;European Journal of Inorganic Chemistry;2015-06-18
4. Grain growth and thermal stability in nanocrystalline Fe–B alloys prepared by melt spinning;International Journal of Materials Research;2015-05-12
5. Low temperature nanocrystalline silicon nitride film grown on silicon (1 1 1) by radio frequency sputtering system;Optik;2015-03