New MOCVD precursor for iridium thin films deposition
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference10 articles.
1. Integration and electrical properties of diffusion barrier for high density ferroelectric memory
2. Electrical conduction properties of sputter-grown (Ba, Sr)TiO3 thin films having IrO2 electrodes
3. Laser‐assisted organometallic chemical vapor deposition of films of rhodium and iridium
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