NSbTe heat-mode resist possessing both positive and negative lithographic characteristics-Reference-Cited by-同舟云学术

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NSbTe heat-mode resist possessing both positive and negative lithographic characteristics

Published:2022-10 Issue: Volume:324 Page:132762
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Shen Wancheng,Chen Lei,Wang Ying,Wei Tao,Hu Jing,Liu Qianqian,Cheng Miao,Li Wanfei,Ling Yun,Liu Bo

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference22 articles.

1. Laser heat-mode lithography: Principle and methods;Wei;Springer, Nature,2019

2. Direct laser writing of polymeric nanostructures via optically induced local thermal effect;Tong;Appl. Phys. Lett.,2016

3. One-step fabrication of submicrostructures by low one-photon absorption direct laser writing technique with local thermal effect;Nguyen;J. Appl. Phys.,2016

4. New calix[4]arene derivatives as maskless and development-free laser thermal lithography materials for fabricating micro/nano-patterns;Deng;J. Mater. Chem. C,2013

5. A study on one-step laser nanopatterning onto copper–hydrazone-complex thin films and its mechanism;Zhang;Phys. Chem. Chem. Phys.,2017

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ge₂Sb₂Te₅ Thin Film as a Promising Heat‐Mode Resist for High‐Resolution Direct Laser Writing Lithography;physica status solidi (RRL) – Rapid Research Letters;2023-08-22

2. Mechanism of Corrosion Selectivity of NSb₂Te Thin Films in the H₃PO₄/HNO₃ Developer for Direct Laser Writing Nanolithography;ACS Applied Nano Materials;2023-07-04

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