Chemical effects in chemical mechanical planarization of TaN: investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy-Reference-Cited by-同舟云学术

Chemical effects in chemical mechanical planarization of TaN: investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy

Published:2005-03 Issue:6 Volume:59 Page:690-693
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Gorantla V.R.K.,Emery S.B.,Pandija S.,Babu S.V.,Roy D.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference14 articles.

1. Advances and Future Challenges,2001

2. Chemical roles of peroxide-based alkaline slurries in chemical–mechanical polishing of Ta: investigation of surface reactions using time-resolved impedance spectroscopy

3. http://www.clarkson.edu/~surop/.

4. Analysis of experimental constraints and variables for time resolved detection of Fourier transform electrochemical impedance spectra

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