The effects of substrate bias on phase stability and properties of sputter-deposited tungsten carbide
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference14 articles.
1. High rate sputtering techniques
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3. Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering
4. Effect of substrate bias on the properties of diamondlike carbon films deposited using unbalanced magnetron sputtering
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1. Detonation Spraying of Binder-Free Tungsten Carbide: In-Situ Formation of Composite Coatings;Journal of Thermal Spray Technology;2022-11-04
2. Influence of WC/C target composition and bias potential on the structure-mechanical properties of non-reactively sputtered WC coatings;Surface and Coatings Technology;2022-02
3. Tungsten Carbides;Ultra-High Temperature Materials IV;2022
4. Electrical and Structural Properties of Non-Reactive Dual Magnetron Sputter Deposited W–C Thin Films for MOSFET Gates;Russian Journal of Physical Chemistry A;2021-05
5. Fabrication and mechanical properties of tungsten carbide thin films via mist chemical vapor deposition;Journal of Alloys and Compounds;2020-07
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