Thermal stability of nonstoichiometric silicon nitride films made by reactive dc magnetron sputter deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. S. Wolf, R.N. Tauber, Silicon Processing for the VLSI Era, Vol. 1, Process Technology, Sunset Beach Lattice Press, CA, USA, 1986.
2. Optical and structural properties of SiOx and SiNx materials
3. Chemical bonds and microstructure in nearly stoichiometric PECVD aSixNyHz
4. Characterization of Reactively Sputtered Silicon Nitride
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Influences of different sputtering current on the microstructure and electrical properties of silicon nitride thin films deposited on cemented carbide tools;Ceramics International;2021-11
2. X-ray fluorescence detection for serial macromolecular crystallography using a JUNGFRAU pixel detector;Journal of Synchrotron Radiation;2020-02-07
3. Investigating the effect of sol–gel solution concentration on the efficiency of silicon solar cells: role of ZnO nanoparticles as anti-reflective layer;Chemical Papers;2019-07-17
4. Preparation of Nanostructured SixN1−x Thin Films by DC Reactive Magnetron Sputtering for Tribology Applications;Silicon;2017-04-24
5. Sputtered Si3N4 and SiO2 electron barrier layer between a redox electrolyte and the WO3 film in electrochromic devices;Solar Energy Materials and Solar Cells;2017-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3