Room temperature deposition of ITO using r.f. magnetron sputtering-Reference-Cited by-同舟云学术

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Room temperature deposition of ITO using r.f. magnetron sputtering

Published:2002-06 Issue:1-2 Volume:413 Page:181-185
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Gorjanc T.C,Leong D,Py C,Roth D

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Transparent conductors—A status review

2. Properties of indium tin oxide thin films prepared by reactive evaporation

3. Electrical properties of vacuum-deposited indium oxide and indium tin oxide films

4. The effect of ambient atmosphere in the annealing of indium tin oxide films

5. Electrical, optical and structural characteristics of indium-tin-oxide thin films deposited on glass and polymer substrates

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