Properties of polycrystalline silicon films prepared from fluorinated precursors-Reference-Cited by-同舟云学术

Properties of polycrystalline silicon films prepared from fluorinated precursors

Published:1999-01 Issue:1-2 Volume:337 Page:7-11
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ray Swati,Mukhopadhyay Sumita,Saha S.C,Hazra Sukti

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference16 articles.

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4. J.M. Poate, J.W. Mayer, Laser Annealing of Semiconductors, Academic Press, New York, 1982.

5. Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method

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