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Pulsed dc magnetron-sputtering of microcrystalline silicon

  • Published:2002-02 Issue: Volume:403-404 Page:86-90
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Reinig P.,Alex V.,Fenske F.,Fuhs W.,Selle B.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gradient coating for NIF double shell targets;Surface and Coatings Technology;2018-09

2. Nanocrystalline silicon films directly made by pulsed-DC magnetron sputtering;Surface and Coatings Technology;2013-08

3. Effects of hydrogen atmosphere on pulsed-DC sputtered nanocrystalline Si:H films;Materials Research Bulletin;2012-10

4. Room-Temperature Deposition of Silicon Thin Films by RF Magnetron Sputtering;Advanced Materials Research;2012-10

5. Dry etching of GaAs in asymmetric bipolar pulsed dc BCl3 plasmas;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-05
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