Author:
Ko D.-H.,Lee N.I.,Kim Y.W.,Lee M.Y.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. S.P. Murarka, Silicides for VLSI Applications, Academic Press, New York, 1983.
2. K. Goto, T. Yamazaki, Y. Nara, T. Fukano. T. Sugii, Y. Arimoto, T. Ito, IEEE Trans. Electron. E77-C (1994) 480.
3. Effect of fluorine in chemical‐vapor‐deposited tungsten silicide film on electrical breakdown of SiO2film
4. S. Wolf, Silicon Processing for the VLSI Era, Vol. 2, Lattice Press, Sunset Beach, CA, 1990.
5. High Temperature Process Limitation on TiSi2
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