Sputter deposited chromium nitride based ternary compounds for hard coatings-Reference-Cited by-同舟云学术

Sputter deposited chromium nitride based ternary compounds for hard coatings

Published:1998-11 Issue:1-2 Volume:332 Page:240-246
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hones P,Sanjinés R,Lévy F

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. The magnetic and structural transitions in CrN and (CrMo)N

2. Structural and mechanical characterization of Cr-Ta-N hard coatings prepared by reactive magnetron sputtering

3. C. Wiemer, Structural and electronical properties of hard transition metal nitrides: Ti1−xVxNy and Ti1−xMoxNx sputtered thin films, Thesis Nr. 1535, EPFL, 1996.

4. Deposition and characterization of refractory ternary phases: the transition metal nitride Ti1 − xMoxNy

5. Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature

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