Deposition and characterization of refractory ternary phases: the transition metal nitride Ti1 − xMoxNy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. Single-phase polycrystalline Ti1−xWxN alloys (0⩽x⩽0.7) grown by UHV reactive magnetron sputtering: microstructure and physical properties
2. The TiMoCN system: Stability of the (Ti, Mo)(C, N)1−x phase
3. Determination of chemical composition and its relationship with optical properties of Ti-N and Ti-V-N sputtered thin films
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3. Mechanical and tribological properties of Hf1-xMoxNy thin films as a function of Mo contents;Surface and Coatings Technology;2019-10
4. Ta addition effects on the structure, mechanical and thermal properties of sputtered Hf-Ta-C film;Ceramics International;2019-08
5. Conductive nitrides: Growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics;Materials Science and Engineering: R: Reports;2018-01
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