Effect of substrate temperature on the deposition of C–N films by pulsed high-temperature C–H–N Plasma CVD-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Effect of substrate temperature on the deposition of C–N films by pulsed high-temperature C–H–N Plasma CVD

Published:2000-02 Issue:1-2 Volume:360 Page:52-55
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Jiang Ying-Bing,Zhang Hong-Xia,Cheng Da-Jun,Yang Si-Ze

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Prediction of New Low Compressibility Solids

2. Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin films

3. Carbon nitride films synthesized by combined ion-beam and laser-ablation processing

4. Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition

5. Deposition of carbon nitride films by vacuum ion diode with explosive emission

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of diamond-like carbon films prepared using various source gases by plasma-based ion implantation and deposition;Surface and Coatings Technology;2018-12

2. Analysis of the energetic parameters of a theta pinch;Review of Scientific Instruments;2009-12

3. Efeito do tratamento térmico na microestrutura, turbostraticidade e superfície de carbono vítreo reticulado analisado por XPS, espalhamento Raman e voltametria cíclica;Química Nova;2009

4. Influence of heat treatment temperature on the morphological and structural aspects of reticulated vitreous carbon used in polyaniline electrosynthesis;Applied Surface Science;2007-08

5. Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films;Plasma Processes and Polymers;2007-04

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3