Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference27 articles.
1. Electron microscopy on high-coercive-force Co-Cr composite films
2. Structure of chromium thin films prepared by plasma deposition
3. Influences of ion energy on morphology and preferred orientation of chromium thin films prepared by ion beam and vapor deposition
4. Electrical and structural characteristics of chromium thin films deposited on glass and alumina substrates
5. Formation of crystallographic texture in rf sputter‐deposited Cr thin films
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1. A study on chromium thin film with positive photoresist as a masking layer towards the wet bulk micromachining of Borofloat glass;Micro and Nano Systems Letters;2024-07-08
2. Effects of substrate temperature and antireflection coating on the structural and optical properties of DC-sputtered chromium thin films for selective solar absorber applications;Journal of the Korean Physical Society;2023-03-29
3. Picosecond Ultrasonics for Studying Elastic Modulus of Polycrystalline Chromium Nanofilms: Thickness Dependence and Stiffness Enhancement;Coatings;2023-02-15
4. Texture in ITO films deposited at oblique incidence by ion beam sputtering;Applied Surface Science;2022-12
5. Optical, structural and electrical properties of sputtered ultrathin chromium films;Optical Materials;2021-11
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