A comparison of the etching behaviour of the FS Cr-free SOI with that of the Secco etching solution on silicon-on-insulator substrates
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference14 articles.
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3. Crystal Surface Defects and Oxygen Gettering in Thermally Oxidized Bonded SOI Wafers
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