The diffusion approximation in atomic mixing
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference14 articles.
1. Implant diffusion with position-dependent diffusion coefficient
2. Atomic mixing in the depth-dependent diffusion approximation
3. Implant profile computation with depth-dependent diffusion
4. On the influence of atomic mixing on the evolution of ion-implantation profiles
5. Distortion of depth profiles during sputtering
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