1. A comprehensive assessment of semiconductor characterization technology is given in W.M. Bullis, D.G. Seiler, A.C. Diebold (Eds.), Semiconductor Characterization: Present Status and Future Needs, AIP Press, Woodbury, 1996.
2. Growth of III–V materials by metalorganic molecular‐beam epitaxy
3. Metalorganic precursors for vapour phase epitaxy
4. Optical
in situ
surface control during MOVPE and MBE growth
5. C. Pickering, in D.T.J. Hurle (Ed.), Handbook of Crystal Growth, Vol. 3, Elsevier, Amsterdam, 1994, p. 817.