1. Effect of organic contaminants on the oxidation kinetics of silicon at room temperature
2. A.J. Muller, L.A. Psota-kelty, J.D. Sinclair, P.W. Morricon, Semiconductor Cleaning Technology/1989, in: J. Ruzyllo, R.E. Novak (Eds.), Proceedings of the Electrochemical Society Series on PV 90–9, Pennington, NJ, 1990, p. 204.
3. K.J. Budde, W.J. Holzapfel, in Semiconductor Wafer Bonding: Science Technology, and Applications/1002, in: U. Gosele, T. Abe, J. Haisma, M.A. Schmidt (Eds.), Proceedings of the Electrochemical Society Series on PV 92-7, Pennington, NJ, 1992, p. 271.
4. Hydrocarbon reaction with HF‐cleaned Si(100) and effects on metal‐oxide‐semiconductor device quality